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Yuka Esashi
Yuka Esashi
JILA
Optics
Ptychography
Extreme ultraviolet lithography
Extreme ultraviolet
Mask inspection
2
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Complex EUV imaging reflectometry: spatially resolved 3D composition determination and dopant profiling with a tabletop 13nm source
2018
Christina L. Porter
Michael Tanksalvala
Michael Gerrity
Galen P. Miley
Yuka Esashi
Naoto Horiguchi
Xiaoshi Zhang
Charles Bevis
Robert Karl
Peter Johnsen
Daniel E. Adams
Henry C. Kapteyn
Margaret M. Murnane
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Prototype through-pellicle coherent imaging using a 30nm tabletop EUV source
2018
Charles Bevis
Robert Karl
Bin Wang
Yuka Esashi
Michael Tanksalvala
Christina L. Porter
Daniel E. Adams
Henry C. Kapteyn
Peter Johnsen
Margaret M. Murnane
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