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D.W. Heh
D.W. Heh
High-κ dielectric
Dielectric
Gate dielectric
Analytical chemistry
Gate oxide
2
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20
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Investigation of First Fire Effect on VTH Stability and Endurance in GeCTe Selector.
2022
IRPS | International Reliability Physics Symposium
P. C. Chang
P. J. Liao
D.W. Heh
C Lee
D.-H. Hou
Elia Ambrosi
C.H. Wu
H. Y. Lee
J.H. Lee
Xinyu Bao
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A low gate leakage current and small equivalent oxide thickness MOSFET with Ti/HfO2 high-k gate dielectric
2011
Microelectronic Engineering
Chung-Hao Fu
Kuei-Shu Chang-Liao
Yee Shyi Chang
Yi-Wen Hsu
T.H. Tzeng
Tzu-Chen Wang
D.W. Heh
Pei-Yi Gu
Ming-Jinn Tsai
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