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T. Lill
T. Lill
Applied Materials
Silicon nitride
Dielectric
Oxide
Sulfur hexafluoride
Reactive-ion etching
2
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7
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Challenges related to linewidth roughness
2012
CSTIC | China Semiconductor Technology International Conference
Erwine Pargon
Laurent Azarnouch
K. Menguelti
Marc Fouchier
M. Brihoum
R Ramos
Raluca Tiron
Olivier Joubert
C. Verove
Nicolas Posseme
Laurent Vallier
Gilles Cunge
Maxime Darnon
Samer Banna
T. Lill
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Reactive ion etch of silicon nitride spacer with high selectivity to oxide
1997
ASMC | Advanced Semiconductor Manufacturing Conference
J. M. Regis
A.M. Joshi
T. Lill
M. Yu
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Citations (7)
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