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Fabian Holzmeier
Fabian Holzmeier
IMEC
Interference lithography
Extreme ultraviolet lithography
Resist
Materials science
Lithography
2
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Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
2021
Fabian Holzmeier
Kevin Dorney
Esben W. Larsen
Thomas Nuytten
Dhirendra P. Singh
Michiel van Setten
Pieter Vanelderen
C. Bargsten
Seth L. Cousin
Daisy Raymondson
Eric Rinard
Rod Ward
Henry C. Kapteyn
Stefan Böttcher
Oleksiy Dyachenko
Raimund Kremzow
Marko Wietstruk
Geoffrey Pourtois
Paul van der Heide
John S. Petersen
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Lloyd’s mirror interference lithography below a 22-nm pitch with an accessible, tabletop, 13.5 nm high-harmonic EUV source
2021
Kevin Dorney
Sonia Castellanos
Esben W. Larsen
Fabian Holzmeier
Dhirendra P. Singh
Nadia Vandenbroeck
Danilo De Simone
Peter De Schepper
Alessandro VaglioPret
C. Bargsten
Seth L. Cousin
Daisy Raymondson
Eric Rinard
Rod Ward
Henry Kaptyen
Thomas Nuytten
Paul van der Heide
John S. Petersen
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