Ptychographic Phase-Sensitive Imaging Reflectometry for Depth-Resolved Nanostructure Characterization using Tabletop EUV Light

Nicholas W. Jenkins,Michael Tanksalvala,Yuka Esashi,Christina L. Porter,Bin Wang,Naoto Horiguchi,Matthew N. Jacobs,Michael Gerrity,Henry C. Kapteyn,Margaret M. Murnane

Ptychographic Phase-Sensitive Imaging Reflectometry for Depth-Resolved Nanostructure Characterization using Tabletop EUV Light

2020

Nicholas W. Jenkins
Michael Tanksalvala
Yuka Esashi
Christina L. Porter
Bin Wang
Naoto Horiguchi
Matthew N. Jacobs
Michael Gerrity
Henry C. Kapteyn
Margaret M. Murnane

We present a versatile, ptychographic phase-sensitive imaging EUV reflectometer that can nondestructively image samples with spatial, depth and compositional resolution, with sensitivities to dopant levels and interface quality.

Keywords:

Reflectometry
Nanostructure
Extreme ultraviolet
phase sensitive
Visible spectrum
Materials science
Optics
Dopant
Extreme ultraviolet lithography
Ptychography

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