Oxidation and Thermal Scanning Probe Lithography for High-Resolution Nanopatterning and Nanodevices

The strength of scanning probe lithography (SPL) lies in the operation at ambient conditions, sub-10 nm resolution capabilities, the in situ non-destructive inspection of the fabricated structures, the nanometric accuracy in positioning, the versatility in modifying any kind of materials, and the freedom in the patterning geometries. On the other hand, the tip size and lifetime-related issues hinder the achievable throughput, and a precise niche of application has yet to be determined for its implementation in technological applications. The complementarity of the high-resolution and precise positioning patterning by SPL and the high throughput and low-resolution patterning by other well-established lithographies (optical, electron beam, nanoimprint) can be achieved by the development of mix-and-match lithography strategies.