Comprehensive aberration analysis in symmetry-free optical systems – part II: Evaluation and application

In part I [Opt. Express29, 39967 (2021)10.1364/OE.439862] of this publication, the working principle of a mixed ray-tracing (MRT) method is introduced for surface-decomposed transverse aberration contributions, and the settings and various calculation options are discussed. Following part I, this paper is a supplement with the evaluation of the calculation results and more illustrations of practical applications, which focuses on the support of the MRT method during the symmetry-free optical system design process. The comprehensive analysis of a group of lithography systems as an application example proves that the MRT method is a powerful tool for imaging system performance assessment, as well as for relative sensitivity analysis among the surfaces in the optical system.