The Guelph PIXE software package II

Abstract Following the introduction of GUPIXWIN in 2005, a number of upgrades have been made in the interests of extending the applicability of the program. Extension of the proton upper energy limit to 5 MeV facilitates the simultaneous use of PIXE with other ion beam analysis techniques. Also, the increased penetration depth enables the complete PIXE analysis of paintings. A second database change is effected in which recently recommended values of L-subshell fluorescence and Coster–Kronig yields are adopted. A Monte Carlo code has been incorporated in the GUPIX package to provide detector efficiency values that are more accurate than those of the previous approximate analytical formula. Silicon escape peak modeling is extended to the back face of silicon drift detectors. An improved description of the attenuation in dura-coated beryllium detector windows is devised. Film thickness determination is enhanced. A new batch mode facility is designed to handle two-detector PIXE, with one detector measuring major elements and the other simultaneously measuring trace elements.