An apparatus for plasma rapid thermal process with an improved supply port of the free radical source

An apparatus for plasma rapid thermal process, comprising: a chamber having a supply port and a discharge port, the same are provided at both ends, wherein a wafer is mounted in the chamber and a heat source in the chamber is provided, and the plurality of lamps for comprises heating the wafer, a gas supply module for supplying process gas, a discharge tube for plasma treatment which is supplied from the gas supply module of the process gas, and a microwave supply apparatus for supplying microwaves to the discharge tube, wherein the supply port of the chamber supplies atomic radicals, wherein said radicals by the plasma treatment of the process gas are formed in the discharge tube, and wherein the supply nozzle comprising: an inner tube, comprising: an end which is opened and connected to the discharge tube, the other end of which is closed, wherein the diameter of a ge closed portion of the other end is smaller than that of other portions of the other end, and a first spray opening, around a ...