Measurement of thin film magnetostriction using field-dependent atomic force microscopy

Abstract Measurement of thin film magnetostriction is a challenging task, as magnetostrictive material deformations in parts per million, in conjunction with materials at small dimensions, require high precision, often with dedicated set-ups, for reproducible results. We have developed a novel approach employing a commercial atomic force microscope (AFM) with attached electromagnets. Magnetostriction measurements are demonstrated on 50 - 500 nm thick Fe81Al19 films sputter deposited directly on high aspect ratio commercial AFM micro-cantilevers. A magnetostrictive deflection of the cantilever bimorph translates into a deflection force acting in a contact mode measurement, which is interpreted and recorded as a change in height. For determination of the magnetostriction coefficient λ s , we have developed a modified version of the equation for the magnetostrictive deflection of a cantilever bimorph by Guerrero and Wetherhold, taking into account long-range attractive forces acting during contact mode AFM measurements in air. The sub-atomic precision of the AFM, combined with the widespread availability of all components and the simple set-up, makes the measurement of magnetostriction on films of just a few tens of nanometers thickness easily accessible.