A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

Seth L. Cousin,C. Bargsten,Eric Rinard,Rod Ward,Erik Hosler,Brennan Petersen,Henity Kapteyn,Pieter Vanelderen,John S. Petersen,Paul van der Heide

A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

2020

Seth L. Cousin
C. Bargsten
Eric Rinard
Rod Ward
Erik Hosler
Brennan Petersen
Henity Kapteyn
Pieter Vanelderen
John S. Petersen
Paul van der Heide

An ultra-short pulsed, ultra-broadband (∼ 13run-∼13 μm) light-source has been developed to drive atto- to femto- second time-resolved studies on EUV photo-resist materials. The same source will also be used to investigate EUV driven nano-lithography.

Keywords:

Extreme ultraviolet lithography
Kinetics
Ultrashort pulse
Optoelectronics
Lithography
Materials science
light source

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