Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering

Luca Mascaretti,Tapan Barman,Beatrice Roberta Bricchi,Filip Munz,Andrea Bassi,Stepan Kment,Alberto Naldoni

Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering

2021

Luca Mascaretti
Tapan Barman
Beatrice Roberta Bricchi
Filip Munz
Andrea Bassi
Stepan Kment
Alberto Naldoni

Abstract Titanium nitride (TiN) is a promising plasmonic material alternative to gold and silver thanks to its refractory character, low resistivity (

Keywords:

Biasing
Titanium nitride
Thin film
Tin
Plasmon
Sputter deposition
Substrate (electronics)
Electrical resistivity and conductivity
Optoelectronics
Materials science

Correction
Source
Cite
Save
Machine Reading By IdeaReader

References

Citations